電子画像研究室

Facilities

• 
  A glove box (vacuum type)
• 
  Gas Purifer System
  Removes oxygen and moisture from inert gas to <1 PPM
  Pure Create Co.,Ltd.
• 
  UV Ozone Cleaner
  Laser Techno_UV-253

Film deposition facilities

• 
  Parylene coater, Lab.Coater, PDS-2010
  JAPAN Parylene（Agency：ThreeBond）
• 
  Vacuum Deposition system I
• 
  Vacuum Deposition system II
• 
  3tagets RF magnetron sputtering system
  (Nichiden) Anelva_SPF-332H
• 
  RF magnetron sputter
  (Nichiden) Anelva_SPF-210
• 
  spin coaterー
  MIKASA 1H-DX�U
• 
  Atomic Absorbtion Spectroscopy (AAS) to monitor and control deposition rates（Fix Cs version）LUXTRON(Agency:R-DEC Co.,Ltd.)
• 
  LB_film system
  Japan Leaser Electronics

Measurement Instruments

• 
  Luminance efficiency measurement system for OLED（voltage source、keithley version）
  PRECISE GAUGES Co.,Ltd._EL1003
• 
  Multi-channel Detector
  Hamamatsu Photonics Co.,Ltd._PMA-11
• 
  Photoluninace(Fluorescence,phosphorent) Spectrophotometer
  HORIBA JOBINYVON_SPEX FluoroMax-P
• 
  OLED life-timemeasurement system
  EHC
• 
  Photo-Electron Spectrometer in Air
  Riken_keiki_AC-1
• 
  Fermi level measurement system
  Riken_keiki_FAC-1
• 
  The profilesmeasurement system(STYLUS GAUSE)
  Dektak³ST
• 
  Riken_keiki_FAC-1(Left)
  and McAllister Kelvin Probe [in Air !] (Right_back side)
• 
  McAllister Kelvin Probe
• 
  McAllister Kelvin Probe
• 
  McAllister Kelvin Probe [in Air !]